Tel: 
Email: 
WhatsApp: Description
Product Introduction
The LAM FI10002 (P/N 660-097960-001) is a critical-path component for maintaining gas delivery integrity in LAM Research etch and deposition systems. If you’re sourcing this part, you’re likely fighting against tool downtime rather than planning a routine upgrade.This unit serves as the gatekeeper for process gas, ensuring the recipe executes with the required precision. We stock verified New Surplus units pulled from dekitted tools, offering a cost-effective alternative to the OEM’s often-prohibitive lead times and pricing. Keep in mind that MFCs are sensitive to contamination; these have been inspected to ensure the internal sensors are clear of debris.
Key Technical Specifications
- Manufacturer: LAM Research
- Full Model: FI10002
- OEM Part Number: 660-097960-001
- Device Type: Mass Flow Controller (MFC)
- Primary Function: Gas Flow Measurement and Control
- Compatibility: LAM FI10002 Series Systems
- Calibration: Specific to gas type and flow range
- Interface: Analog / Digital (Verify specific revision)
Application Scenarios & Pain Points
A faulty MFC doesn’t just cause an alarm; it corrupts wafers and invalidates process logs. Imagine the frustration of the process engineer when the endpoint detection is off because the gas flow isn’t matching the setpoint. Replacing this isn’t about maintenance; it’s about restoring process confidence.
- Semiconductor Etching: Maintaining stoichiometric gas ratios in plasma etch chambers where even a 1% flow deviation scrapes a $500 wafer.
- Thin Film Deposition: Regulating precursor gas flow in CVD chambers, where inconsistent delivery leads to non-uniform film thickness.
- Gas Panel Retrofit: Upgrading legacy tool gas boxes where the original MFC electronics are obsolete but the process demands remain.
- Leak Testing Stations: Providing a known-good flow reference point for helium leak detectors in vacuum system QA.
