AMAT 0041-31335 | Electrostatic Chuck (ESC) Plate – Bare Base

  • Model: 0041-31335
  • Brand: Applied Materials (AMAT)
  • Series: Centura / Endura
  • Core Function: Electrostatic chucking base plate for 200 mm wafer handling systems.
  • Type: Electrostatic Chuck (ESC) Component
  • Key Specs: 200 mm / Aluminum / For Centura platforms
Category: SKU: AMAT 0041-31335

Description

Product Introduction

Applied Materials (AMAT) 0041-31335 is an electrostatic chuck (ESC) base plate engineered for 200 mm semiconductor process chambers. This component serves as the foundational mounting surface for the ceramic ESC puck, ensuring precise wafer fixation during etch or PVD cycles.Its primary role is structural and thermal—providing a rigid, flat mounting interface that minimizes deformation under vacuum and plasma conditions. In high-cycle refurbishment scenarios, verifying the flatness of this base plate prevents costly damage to the overlying ceramic electrode. It is typically found in Centura or Endura cluster tools where wafer temperature control is critical.

Key Technical Specifications

  • Compatible System: AMAT Centura, Endura
  • Wafer Size: 200 mm (8 inch)
  • Component Type: ESC Base Plate
  • Material: Aluminum
  • Surface Finish: Conductive anodize (typical)
  • Mounting Interface: Standard AMAT flange pattern
  • Cycle Count: Low (varies by batch)
  • Test Status: Verified mechanically sound

Application Scenarios & Pain Points

In a 24/7 wafer fab, the electrostatic chuck is the linchpin of process stability. If the base plate warps or loses grounding integrity, the entire chamber risks particle contamination or arcing faults.

  • Etch Process Lines: Maintains wafer position during high-power RF plasma. A warped base plate here causes non-uniform etch rates across the wafer.
  • Physical Vapor Deposition (PVD): Manages thermal expansion during metal sputtering. If the aluminum base has uneven thermal conductivity, the wafer may slip mid-deposition.
  • Chamber Rebuilds: During preventive maintenance, technicians often reuse the base plate while replacing the ceramic top layer. Matching the flatness spec here is non-negotiable.
  • Helium Backing Systems: This plate integrates with helium gas channels for cooling. Any scratch on the mounting face can create a helium leak path, triggering vacuum faults.
  • Retrofit Projects: When upgrading legacy 200 mm lines, sourcing a low-cycle base plate like this one avoids the cost of a full OEM rebuild.